Thickness Analysis for Thin-Film by Glazing Exit X-ray Fluorescence With Synchrotron Radiation Source

GONG Yan; CHEN Bo; NI Qi-Liang; CUI Ming-Qi; ZHAO Yi-Dong; WU Zhong-Hua

Chinese Physics C> 2005, Vol. 29> Issue(11) : 1104-1106

Thickness Analysis for Thin-Film by Glazing Exit X-ray Fluorescence With Synchrotron Radiation Source

State Key Lab of Applied Optics,the Institute of Optics,Fine Mechanics and Physics,CAS,Changchun 130033,China2 Institute of High Energy Physics,CAS,Beijing 100049,China

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Abstract：
The grazing exit X-ray fluorescence provides a possibility to analyze the characteristics of thin film and multilayer, especially the thickness, interface structure and composition.The Cr film samples with different thickness deposited on silicon (Si) bases are tested with grazing method using Beijing synchrotron radiation source (SR) as excitation light.The results agree with the theoretical prediction, and the interference of emitted X-ray has been observed.

References

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GONG Yan, CHEN Bo, NI Qi-Liang, CUI Ming-Qi, ZHAO Yi-Dong and WU Zhong-Hua. Thickness Analysis for Thin-Film by Glazing Exit X-ray Fluorescence With Synchrotron Radiation Source[J]. Chinese Physics C, 2005, 29(11): 1104-1106.

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Received: 2005-01-11
Revised: 1900-01-01

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