Studies on Wehnelt of Electron-Beam Accelerator
- Received Date: 2004-06-21
- Accepted Date: 1900-01-01
- Available Online: 2005-03-05
Abstract: Electron beam can be focused into a small spot with the diameter of only about nanometers theoretically,and easily controlled.It cannot be replaced by any other micro fabrication techniques in mask-making of VLSI (Very Large-Scale Integration).Based on the electron gun of SDS-3 electron beam lithography machine,the concave hyperboloid Wehnelt(oxide-coated cover)of accelerator is discussed.The electron trajectories and potential distribution are given.Electrons from the gun accelerated by a high voltage reached a target of silicon piece(In front of the aperture)via the Wehnelt.Finally,spots of E-beam in the silicon piece and the geometry schematics for Wehnelt of accelerator are given.