A STUDY OF DEFECTS DEFECTS IN GaAs BY POSITRON ANNIHILATION
- Received Date: 1900-01-01
- Accepted Date: 1900-01-01
- Available Online: 1986-08-05
Abstract: The defects in GaAs grown with the melt growth method at 1238℃ and with the Te-doped LPE method in the temperature range 750—950℃ are studied by positron annihilation. The lifetime component τ2 exhibits a constant value of 312±11ps in the temperature range 800—1238℃. The intensity I2 increases with the growth temperature. In the Te-doped LPE crystals, the concentration of the positron trap increases linearly with temperature. The trap is considered as Ga vacancy. The results show that doped Te in GaAs induces Ga vacancy.