X-ray nanometer focusing at the SSRF based on a multilayer Laue lens

ZHU Jing-Tao; TU Yu-Chun; LI Hao-Chuan; YUE Shuai-Peng; HUANG Qiu-Shi; LI Ai-Guo; WANG Zhan-Shan

doi:10.1088/1674-1137/39/12/128001

Chinese Physics C> 2015, Vol. 39> Issue(12) : 128001 DOI: 10.1088/1674-1137/39/12/128001

X-ray nanometer focusing at the SSRF based on a multilayer Laue lens

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Abstract：
We designed and fabricated a multilayer Laue lens (MLL) as a hard X-ray focusing device. WSi₂/Si multilayers were chosen owing to their excellent optical properties and relatively sharp interface. The multilayer sample was fabricated by using direct current (DC) magnetron sputtering technology and then was sliced and thinned to form an MLL. The thickness of each layer was determined by scanning electron microscopy (SEM) image analysis with marking layers. The focusing property of the MLL was measured at Beamline 15U, Shanghai Synchrotron Facility (SSRF). One-dimensional (1D) focusing resolutions of 92 nm are obtained at photon energy of 14 keV.
- hard X-ray ,
- nano-focusing ,
- multilayer Laue lens (MLL) ,
- synchrotron radiation

References

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ZHU Jing-Tao, TU Yu-Chun, LI Hao-Chuan, YUE Shuai-Peng, HUANG Qiu-Shi, LI Ai-Guo and WANG Zhan-Shan. X-ray nanometer focusing at the SSRF based on a multilayer Laue lens[J]. Chinese Physics C, 2015, 39(12): 128001. doi: 10.1088/1674-1137/39/12/128001

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Received: 2015-02-28
Revised: 2015-07-21

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Supported by National Natural Science Foundation of China (U1432244, 11375131) and Major State Basic Research Development Program (2011CB922203)

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沈阳化工大学材料科学与工程学院沈阳 110142

X-ray nanometer focusing at the SSRF based on a multilayer Laue lens

Corresponding author: ZHU Jing-Tao,

Received Date: 2015-02-28
Accepted Date: 2015-07-21
Available Online: 2015-12-20

Fund Project: Supported by National Natural Science Foundation of China (U1432244, 11375131) and Major State Basic Research Development Program (2011CB922203)

Abstract: We designed and fabricated a multilayer Laue lens (MLL) as a hard X-ray focusing device. WSi₂/Si multilayers were chosen owing to their excellent optical properties and relatively sharp interface. The multilayer sample was fabricated by using direct current (DC) magnetron sputtering technology and then was sliced and thinned to form an MLL. The thickness of each layer was determined by scanning electron microscopy (SEM) image analysis with marking layers. The focusing property of the MLL was measured at Beamline 15U, Shanghai Synchrotron Facility (SSRF). One-dimensional (1D) focusing resolutions of 92 nm are obtained at photon energy of 14 keV.