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《中国物理C》（英文）编辑部
2024年10月30日
Chinese Physics C> 2005, Vol. 29> Issue(5) : 501-506 

Study On Character of Backstreaming Ions Source

  •  Department of Engineering Physics of Tsinghua University,Beijing 100084,China2 China Academy of Engineering Physics,Mianyang 621900,China

  • Plasma could be produced when intense electron beams striking on converter target materials, such as Ta. The beam space charge may draw an ion current out of the plasma, which could substantially affect the final focus of beam on the target. This is called backstreaming ions effect. Since focus-spot is a key point for good radiography in X-ray machine research, the backstreaming ions effect gets much concerns. Based on our analyses, it is believed that generally the backstreaming ions are mainly from thermal desorption of contaminant on the Ta target surface. The ion emission is restricted by the space-charge effect, not by the ions source power.
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    [1] .Welch D R,Hughes T P.Laser and Part icle Beam,1997,16( 2):285-2942.Kwan T J T,Snell C M,Christ enson P J.Physics of Plasmas,2000,7( 5):2215-22233.Kwan T J T.Simulat ions,Experiment s and Analysis of Beam Target In-teraction.Proceeding of the 1999 Part icle Accelerator Conf erence.NewYork,1999,1842-18444.Kwan T J T.IEEE Transact ions on Plasma Science,2000,28( 1):268-2705.CHEN Yu-Jiuan,Caporaso G J,Arthur C P.Controlling BackstreamingIons from X-Ray Converter Target s with Time Varying Final FocusingSolenoidal Lens and Beam Energy Variation.Proceedings of Linear Ac-celerator Conference.Chicago:NTIS,Springfield,VA,1998.472-4746.Caporaso G J,CHEN Yu-Jiuan.Analyt ic Model of Ion Emission fromthe Focus of an Intense Relativistic Elect ron Beam on a Target.Pro-ceedings of Linear Accelerator Conference.Chicago:NTIS,Springfield,VA,1998.830-8327.Sampayan S,Buckles R et al.Beam-Target Interaction Experiments for Bremsstrahlung Converter Applications.Proceedings of Particle Acceler-ator Conference.New York:IEEE,1999.1303-13058.Guethlein G et al.Faraday Cup Measurements of Ions Backst reaming in-to a Electron Beam Impinging on a Plasma Plume.Proceedings of LinearAccelerat or Conf erence.Mont erey,Cal ifornia,2000.467-4699.Sampayan S et al.Beam-Target Interaction Experiment s for BremsstrahlungConverter Applications.Proceedings of Part icle Accelerator Conference.Chicago:IEEE,2001.330-33210.Vermare C et al.Experimental Results of Electron Beam NeutralizationInduced by A Limited Space-Charge Emission.Proceedings of LinearAccelerat or Conf erence.Chicago:NTIS,Springfield,VA,1998,394-39611.Vermare C et al.Strong Self- Focusing of a 7.2 MeV Electron BeamStriking an Aluminized Mylar Target.IEEE Trans.Plasma Sci.,1999;27(6):1566-157112.CHEN S F.Time-Resolved Profile Measurements of High Current Shot-Pulse Electron-Beams.Post-Doct or Research Report,China Academicof Engineer Physics,2001.50-52 (in Chinese)(陈思富.强烈短脉冲电子束束剖面的时间分辨测量中国工程物理研究院流体物理研究所博士后研究工作报告,2001.50-52)13.Oliver B V et al.Beam-Target Int eract ions in Single and Mult i-PulseRadiography:UCRL-CR-134271.30-4314.Cuneo M E.IEEE Trans.On Dielectrics and Electrical Insulation,1999,6( 4):469-48515.Sanford T W L et al.J.Appl.Phys.,1989,66(1):10-2216.Cuneo M E.IEEE Trans.on Plasma Sci.,1987,15(4):375-38317.Swain D W et al.Journal of Applied Physics,1975,46:4604-460518.LONG J D,LIN Y Z et al.HEP NP,2004,28( 5):564-568 ( in Chinese)(龙继东,林郁正等.高能物理与核物理,2004,28 (5):564-568)19.Roth A.Vacuum Technology.Beijing:China Machine Press,1980.32 33,138-142(in Chinese)(A.罗斯.真空技术.北京:机械工业出版社,1980.32-33,138-142)20.WANG Yu-Zhi.Vacuum Technology.Chengdu:Publisher of SichuanPeople,1982.105,123(in Chinese)(王欲知.真空技术.成都:四川人民出版社,1982.105,123)21.Kim Y-K,Rudd M E.Phys.Rev.,1994,A50:3954 -396722.Kim Y-K,Santos J P,Parente F.Phys.Rev.,2001,A62:05271023.Pereira N R.IEEE Trans.on Plasma Sci.,1999,27(4):1169 -117424.YANG Jin-Ji.Gas Discharge.Beijing:Science Press,1983,106- 108(in Chinese)(杨津基.气体放电北京:科学出版社,1983.106-108)25.Weber B V,St ephanakis S J et al.Suppression of Ion Emission andPinching Using Heated Tantalum Anodes in High-Power Electron-BeamDiodes.Proceedings of BEAM.Nagaoka,Japan,2000.206 -20926.Weissler G L,Carlson R W.Vacuum Physics and Technology.Beijing:Atomi c Energy Press,1990.219(in Chinese)(G.L威斯勒,R.W卡尔森真空物理和技术.北京:原子能出版社,1990.219)

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LONG Ji-Dong, SHI Jin-Shui, YU Hai-Jun and LIN Yu-Zheng. Study On Character of Backstreaming Ions Source[J]. Chinese Physics C, 2005, 29(5): 501-506.
LONG Ji-Dong, SHI Jin-Shui, YU Hai-Jun and LIN Yu-Zheng. Study On Character of Backstreaming Ions Source[J]. Chinese Physics C, 2005, 29(5): 501-506. shu
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Received: 2004-07-19
Revised: 2004-09-07
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Study On Character of Backstreaming Ions Source

    Corresponding author: LIN Yu-Zheng,
  • Department of Engineering Physics of Tsinghua University,Beijing 100084,China2 China Academy of Engineering Physics,Mianyang 621900,China
  • Received Date: 2004-07-19
  • Accepted Date: 2004-09-07
  • Available Online: 2005-05-05

Abstract: Plasma could be produced when intense electron beams striking on converter target materials, such as Ta. The beam space charge may draw an ion current out of the plasma, which could substantially affect the final focus of beam on the target. This is called backstreaming ions effect. Since focus-spot is a key point for good radiography in X-ray machine research, the backstreaming ions effect gets much concerns. Based on our analyses, it is believed that generally the backstreaming ions are mainly from thermal desorption of contaminant on the Ta target surface. The ion emission is restricted by the space-charge effect, not by the ions source power.

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