Strain relaxation and magnetoresistance of La0.7Ca0.3MnO3 film deposited on MgO substrate

Get Citation
TAN Wei-Shi, CAI Hong-Ling, LIU Jin-Sheng, WU Xiao-Shan, JIANG Shu-Shen and JIA Quan-Jie. Strain relaxation and magnetoresistance of La0.7Ca0.3MnO3 film deposited on MgO substrate[J]. Chinese Physics C, 2005, 29(S1): 20-23.
TAN Wei-Shi, CAI Hong-Ling, LIU Jin-Sheng, WU Xiao-Shan, JIANG Shu-Shen and JIA Quan-Jie. Strain relaxation and magnetoresistance of La0.7Ca0.3MnO3 film deposited on MgO substrate[J]. Chinese Physics C, 2005, 29(S1): 20-23. shu
Milestone
Received: 2005-10-28
Revised: 1900-01-01
Article Metric

Article Views(2670)
PDF Downloads(622)
Cited by(0)
Policy on re-use
To reuse of subscription content published by CPC, the users need to request permission from CPC, unless the content was published under an Open Access license which automatically permits that type of reuse.
通讯作者: 陈斌, bchen63@163.com
  • 1. 

    沈阳化工大学材料科学与工程学院 沈阳 110142

  1. 本站搜索
  2. 百度学术搜索
  3. 万方数据库搜索
  4. CNKI搜索

Email This Article

Title:
Email:

Strain relaxation and magnetoresistance of La0.7Ca0.3MnO3 film deposited on MgO substrate

    Corresponding author: TAN Wei-Shi,
  • Department of Applied Physics, Nanjing University of Science and Technology, Nanjing 210094, China2 National Key Laboratory of Solid State Microstructures, Department of Physics, Nanjing University,Nanjing 210093, China3 Institute of High Energy Physics, Chinese Academy of Sciences, Beijing 100049, China

Abstract: La0.7Ca0.3MnO3(LCMO) thin films with the thickness ranging from 5 nm to 200 nm were deposited on (001)-oriented single crystal MgO substrate by 90° off-axis radio frequency magnetron sputtering. Grazing incidence X-ray diffraction technique, combined with normal X-ray diffraction, was applied to study the lattice strain and strain relaxation in LCMO films. The magnetoresistance of films were measured by means of standard four-probe technique. The results indicated that the microstrain of LCMO/MgO film began to relax when the film thickness is less than 5 nm. The LCMO film is fully strain-relaxed with thickness larger than 100 nm and exhibit LCMO bulk-like magnetoresistance properties, i.e. with relatively lager magnetoresistance ratio and higher peak temperature of magnetoresistance.

    HTML

Reference (1)

目录

/

DownLoad:  Full-Size Img  PowerPoint
Return
Return